Step coverage modeling of thin films in atomic layer deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2714685
Reference28 articles.
1. Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition
2. Metal–organic atomic-layer deposition of titanium–silicon–nitride films
3. Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies
4. Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
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