Light-coupling masks for lensless, sub-wavelength optical lithography
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.121362
Reference6 articles.
1. Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
2. Stability of molded polydimethylsiloxane microstructures
3. Complex Optical Surfaces Formed by Replica Molding Against Elastomeric Masters
4. Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications
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