Self-organization of SiO2 nanodots deposited by chemical vapor deposition using an atmospheric pressure remote microplasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3360228
Reference18 articles.
1. Homogeneous nanocrystalline cubic silicon carbide films prepared by inductively coupled plasma chemical vapor deposition
2. Colloquium:Reactive plasmas as a versatile nanofabrication tool
3. Synthesis of Blue Luminescent Si Nanoparticles Using Atmospheric-Pressure Microdischarges
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5. Long-Range Ordering of Oxygen-Vacancy Planes in α-Fe2O3 Nanowires and Nanobelts
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