Nanosphere monolayer-templated, ion-assisted nanofeature etching in dielectric materials: a numerical simulation of nanoscale ion flux topography-Reference-Cited by-同舟云学术

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Nanosphere monolayer-templated, ion-assisted nanofeature etching in dielectric materials: a numerical simulation of nanoscale ion flux topography

Published:2008-03-11 Issue:15 Volume:19 Page:155304
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Yuan Luqi,Zhong Xiaoxia,Ostrikov Kostya (Ken)

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/19/i=15/a=155304/pdf

Reference36 articles.

1. Helical microtubules of graphitic carbon

2. Engineering of nanostructured carbon materials with electron or ion beams

3. A Laser Ablation Method for the Synthesis of Crystalline Semiconductor Nanowires

4. Colloquium:Reactive plasmas as a versatile nanofabrication tool

5. Fabrication and electrical characteristics of Si nanocrystal/c-Si heterojunctions

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1. Nanotechnology: Plasma-Based;Encyclopedia of Plasma Technology;2016-12-12

2. Plasma nanoscience: from nano-solids in plasmas to nano-plasmas in solids;Advances in Physics;2013-04

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4. Gold nanoresistors with near-constant resistivity in the cryogenic-to-room temperature range;Journal of Applied Physics;2011-07-15

5. On the origin of self-organization of SiO2nanodots deposited by CVD enhanced by atmospheric pressure remote microplasma;Journal of Physics D: Applied Physics;2011-04-14

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