Physical origin of the endurance improvement for HfO2-ZrO2 superlattice ferroelectric film

Author:

Gong Zhi1ORCID,Chen Jiajia1ORCID,Peng Yue2ORCID,Liu Yan2ORCID,Yu Xiao1ORCID,Han Genquan12ORCID

Affiliation:

1. Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China

2. School of Microelectronics, Xidian University, Xi'an 710071, China

Abstract

HfO2-ZrO2 superlattice (SL) ferroelectric (FE) ultrathin films exhibit significant improvement in endurance performance compared with solid-solution HfxZr1−xO2 (HZO). Despite the experimental evidence, the underlying microscopic mechanisms of the enhanced reliability of SL remain elusive. This Letter explores the mechanism by performing first-principle calculations on SL and HZO systems. The enhanced endurance in the SL can be well explained by higher oxygen vacancy (Vo) migration energy barriers along the FE polarization direction, which slow down the increase in Vo. The suppression of Vo increase will potentially help maintain the stability of the FE phase and alleviate the fatigue. Based on this mechanism, we suggest that doping materials with higher Vo migration barriers can further improve the endurance of HfO2-based FE devices. This work facilitates the future development of HfO2-based FE devices with enhanced endurance and reliability.

Funder

Zhejiang Lab

Zhejiang Province Key R&D programs

Zhejiang Provincial Natural Science Foundation

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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