Physical origin of the endurance improvement for HfO2-ZrO2 superlattice ferroelectric film
Author:
Affiliation:
1. Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
2. School of Microelectronics, Xidian University, Xi'an 710071, China
Abstract
Funder
Zhejiang Lab
Zhejiang Province Key R&D programs
Zhejiang Provincial Natural Science Foundation
National Key Research and Development Program of China
National Natural Science Foundation of China
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0127136
Reference34 articles.
1. Ferroelectricity in hafnium oxide thin films
2. Ordering of Oxygen Vacancies and Related Ferroelectric Properties in HfO2−δ
3. Phase competition in HfO2 with applied electric field from first principles
4. Back‐End‐of‐Line Compatible Low‐Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation
5. Ferroelectric structural transition in hafnium oxide induced by charged oxygen vacancies
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