Ordering of Oxygen Vacancies and Related Ferroelectric Properties in HfO2−δ
Author:
Funder
Deutsche Forschungsgemeinschaft
Forschungszentrum Jülich
JARA-HPC
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.127.087602/fulltext
Reference62 articles.
1. Ferroelectric thin films: Review of materials, properties, and applications
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4. Ferroelectricity in hafnium oxide thin films
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