Preparation of thin windows in silicon masks for x‐ray lithography
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.322117
Reference10 articles.
1. High-resolution pattern replication using soft X rays
2. Cathodoluminescence assessment of GaAs1−x Px for light emitting diodes
3. High‐speed low‐power x‐ray lithography
4. A Water-Amine-Complexing Agent System for Etching Silicon
5. Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped Silicon
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