Stresses in TaSixfilms sputter deposited on polycrystalline silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.338326
Reference11 articles.
1. Refractory Silicides of Titanium and Tantalum for Low-Resistivity Gates and Interconnects
2. MOS Compatibility of high-conductivity TaSi2/n+poly-Si gates
3. Elastic stiffness and thermal expansion coefficients of various refractory silicides and silicon nitride films
4. Silicide formation in thin cosputtered (tantalum + silicon) films on polycrystalline silicon and SiO2
5. Stress distributions and thin film mechanical properties
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