Silicide formation in thin cosputtered (tantalum + silicon) films on polycrystalline silicon and SiO2
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.327814
Reference4 articles.
1. Thin film interaction between titanium and polycrystalline silicon
2. Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.
3. X-ray analysis of sputtered films of beta-tantalum and body-centered cubic tantalum
4. The formation of vanadium silicides at thin‐film interfaces
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