Composition of phosphorus‐nitride film deposited on InP surfaces by a photochemical vapor deposition technique and electrical properties of the interface
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104192
Reference12 articles.
1. Effects on InP surface trap states ofinsituetching and phosphorus‐nitride deposition
2. Effects of deposition temperature of insulator films on the electrical characteristics of InP metal‐insulator‐semiconductor field‐effect transistors
3. Sulfur as a surface passivation for InP
4. A self‐consistent computer simulation of compound semiconductor metal‐insulator‐semiconductorC‐Vcurves based on the disorder‐induced gap‐state model
5. Characterization of pulsed laser deposited boron nitride thin films on InP
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