Combined experimental and modeling studies of microwave activated CH4/H2/Ar plasmas for microcrystalline, nanocrystalline, and ultrananocrystalline diamond deposition-Reference-Cited by-同舟云学术

Combined experimental and modeling studies of microwave activated CH4/H2/Ar plasmas for microcrystalline, nanocrystalline, and ultrananocrystalline diamond deposition

Published:2011-03-15 Issue:6 Volume:109 Page:063307
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Richley James C.,Fox Oliver J. L.,Ashfold Michael N. R.,Mankelevich Yuri A.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3562185

Reference50 articles.

1. D. G. Goodwin and J. E. Butler, in Handbook of Industrial Diamonds and Diamond Films, edited by M. A. Prelas, G. Popovici, and L. K. Bigelow (Marcel Dekker, New York, 1998), pp. 527–581, and references therein.

2. Understanding the chemical vapor deposition of diamond: recent progress

3. Modelling of diamond deposition microwave cavity generated plasmas

4. Effects of noble gases on diamond deposition from methane‐hydrogen microwave plasmas

5. Synthesis of nanocrystalline diamond thin films from an Ar–CH4 microwave plasma

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