Investigation of CHF3 treatment on the energy band at the MoS2/HfZrO4 heterostructure

Author:

Li Kuilong12,Li Zhiwen1,Hong Yuehua1,Hu Cong1,Mao Wei3,Liu Xinke1

Affiliation:

1. College of Materials Science and Engineering, Shenzhen Key Laboratory of Micro-Scale Optical Information Technology, Shenzhen Key Laboratory of Special Functional Materials, Chinese Engineering and Research Institute of Microelectronics, Guangdong Research Center for Interfacial Engineering of Functional Materials, Shenzhen University, 3688 Nanhai Ave., Shenzhen 518060, People's Republic of China

2. Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Optoelectronic Engineering, Shenzhen University, 3688 Nanhai Ave., Shenzhen 518060, People's Republic of China

3. The Institute of Engineering Innovation, School of Engineering, The University of Tokyo, Tokyo 113-0032, Japan

Funder

National Science Foundation of SZU

Natural Taipei University of Technology-Shenzhen University Joint Research Program

Public Welfare Capacity Building in Guangdong Province

Shenzhen Key Laboratory of Micro-Scale Optical Information Technology

the National Key Research and Development Program of China

the PhD Start-up Fund of Natural Science Foundation of Guangdong Province

the Science and Technology Foundation of Shenzhen

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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