Kinetics of photoresist etching in an electron cyclotron resonance plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346598
Reference14 articles.
1. Oxygen plasma etching for resist stripping and multilayer lithography
2. Ion energy and anisotropy in microwave plasma etching of polymers
3. Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas
4. The etching of polymers in oxygen‐based plasmas: A parametric study
5. Oxidation of silicon in an electron cyclotron resonance oxygen plasma: Kinetics, physicochemical, and electrical properties
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