Affiliation:
1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, School of Physics, Dalian University of Technology, Dalian 116024, People's Republic of China
2. College of Physical Science and Technology, Dalian University, Dalian 116622, People's Republic of China
Abstract
The effects of gas pressure and gas component on the power transfer efficiency [Formula: see text] and transition power threshold [Formula: see text] during the E–H mode transition in inductively coupled plasmas are studied. The evolutions of [Formula: see text] during the E–H mode transition in pure Ar and Ar/O2 discharges are similar, i.e., in E-mode discharge, [Formula: see text] slightly increases with raising the applied power ([Formula: see text] is below 30%), whereas, an abruptly upward jump of nearly two to four times for [Formula: see text] occurs when the discharge transits to H-mode, and then [Formula: see text] monotonously increases with increasing the applied power. In addition, as the pressure rises, [Formula: see text] increases rapidly first and then slowly in pure Ar discharge. However, [Formula: see text] in Ar/O2 mixture gases discharge shows a non-monotonic behavior. It reveals a tendency of first increase at low pressures and then decreases at high pressures, which is because the resistive component of the plasma varies with the electron density [Formula: see text] and the electron effective collision frequency [Formula: see text]. Furthermore, a non-monotonic behavior of transition power threshold [Formula: see text] with the pressure is found, i.e., with increasing the pressure, [Formula: see text] first decreases and then increases. It may be caused by the threshold electron density, which is constant at low pressures [Formula: see text] but increases at high pressures [Formula: see text].
Funder
National Natural Science Foundation of China
Fundamental Research Funds for the Central Universities
Subject
General Physics and Astronomy
Cited by
1 articles.
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