Experimental characterization of reactive ion etched germanium diffraction gratings at 10.6 μm
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.117249
Reference11 articles.
1. Amorphous and polycrystalline Ge-metal films prepared by physical vapour deposition
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4. GexSi1−xstrained‐layer heterostructure bipolar transistors
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