Influence of spot size on extreme ultraviolet efficiency of laser-produced Sn plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3270526
Reference12 articles.
1. EUV Sources for Lithography
2. Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets
3. Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source
4. Extreme ultraviolet source using a forced recombination process in lithium plasma generated by a pulsed laser
5. Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target
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