Gas temperature in a hot filament diamond chemical vapor deposition system
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1146886
Reference24 articles.
1. Low-Pressure, Metastable Growth of Diamond and "Diamondlike" Phases
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5. Methyl radical production in a hot filament CVD system
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1. Numerical calculation of temperature, velocity, and species concentration distributions in a hot filament chemical vapor deposition in a reactor using a CH4/H2 mixture;Journal of Engineering and Applied Science;2022-08-19
2. Production and Detection of H Atoms and Vibrationally Excited H2 Molecules in CVD Processes;Chemical Vapor Deposition;2010-12
3. Ab Initio Study of the Role of Entropy in the Kinetics of Acetylene Production in Filament-Assisted Diamond Growth Environments;The Journal of Physical Chemistry A;2005-12-08
4. Cavity ring-down spectroscopy of CH and CD radicals in a diamond thin film chemical vapor deposition reactor;Applied Physics A Materials Science & Processing;2001-07
5. On the mechanism of CH3 radical formation in hot filament activated CH4/H2 and C2H2/H2 gas mixtures;Diamond and Related Materials;2001-03
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