Magnetic field effects on secondary electron emission during ion implantation in a nitrogen plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2201695
Reference18 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
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4. Nitrogen and carbon expanded austenite produced by PI3
5. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes
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2. Experimental study on the effect of longitudinal magnetic field on Townsend discharge characteristics in low pressure argon gas;International Journal of ADVANCED AND APPLIED SCIENCES;2017-02
3. Effects of strong magnetic field on plasma immersion ion implantation of dielectric substrates;Vacuum;2009-08
4. Physics of plasma-based ion implantation & deposition (PBIID) and high power impulse magnetron sputtering (HIPIMS): A comparison;physica status solidi (a);2008-04
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