In situ TEM study of electron-beam radiation induced boron diffusion and effects on phase and microstructure evolution in nanostructured CoFeB/SiO2 thin film-Reference-Cited by-同舟云学术

In situ TEM study of electron-beam radiation induced boron diffusion and effects on phase and microstructure evolution in nanostructured CoFeB/SiO2 thin film

Published:2017-01-07 Issue:1 Volume:121 Page:015111
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Liu B. H.^ORCID,Teo H. W.,Mo Z. H.,Mai Z. H.,Lam J.,Xue J. M.,Zhao Y. Z.,Tan P. K.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4973579

Reference48 articles.

1. 230% room-temperature magnetoresistance in CoFeB∕MgO∕CoFeB magnetic tunnel junctions

2. Variation in the properties of the interface in a CoFeB∕MgO∕CoFeB tunnel junction during thermal annealing

3. Annealing effects on structural and transport properties of rf-sputtered CoFeB∕MgO∕CoFeB magnetic tunnel junctions

4. Atomic-Scale Structure and Local Chemistry of CoFeB–MgO Magnetic Tunnel Junctions

5. A nondestructive analysis of the B diffusion in Ta–CoFeB–MgO–CoFeB–Ta magnetic tunnel junctions by hard x-ray photoemission

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