Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4893558
Reference61 articles.
1. On the balance between silylene and silyl radicals in rf glow discharges in silane: The effect on deposition rates ofa‐Si:H
2. Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films
3. Reversible conductivity changes in discharge‐produced amorphous Si
4. Thin film silicon solar cells grown near the edge of amorphous to microcrystalline transition
5. Real-time spectroscopic ellipsometry study of the growth of amorphous and microcrystalline silicon thin films prepared by alternating silicon deposition and hydrogen plasma treatment
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