Effect of fluorine on dielectric properties of SiOF films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.363512
Reference7 articles.
1. MOSFET test structures for two-dimensional device simulation
2. Low Dielectric Constant Interlayer Using Fluorine-Doped Silicon Oxide
3. A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnections
4. Effect of porosity on infrared‐absorption spectra of silicon dioxide
5. Atomic structure in SiO2 thin films deposited by remote plasma‐enhanced chemical vapor deposition
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