A new analytical method for modeling a 2D electrostatic potential in MOS devices, applicable to compact modeling
Author:
Affiliation:
1. Electronics Engineering Department, Universitat Rovira i Virgili (URV) 1 , Tarragona 43007, Spain
2. Technische Hochschule Mittelhessen, Competence Center for Nanotechnology and Photonics 2 , Wiesenstrasse 14, Giessen 35390, Germany
Abstract
Funder
Ministerio de Asuntos Económicos y Transformación Digital, Gobierno de España
Publisher
AIP Publishing
Link
https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0188863/19860477/044501_1_5.0188863.pdf
Reference16 articles.
1. Three-dimensional closed-form model for potential barrier in undoped FinFETs resulting in analytical equations for VT and subthreshold slope;IEEE Trans. Electron Devices,2008
2. Scaling the Si MOSFET: From bulk to SOI to bulk;IEEE Trans. Electron Devices,1992
3. Scaling theory for double-gate SOI MOSFET’s;IEEE Trans. Electron Devices,1993
4. A quasi-two-dimensional compact drain–current model for undoped symmetric double-gate MOSFETs including short-channel effects;IEEE Trans. Electron Devices,2008
5. Physics-based compact model for ultra-scaled FinFETs;Solid-State Electron.,2011
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