Stress in polycrystalline and amorphous silicon thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332628
Reference5 articles.
1. Local Stress Measurement in Thin Thermal SiO2 Films on Si Substrates
2. A simple technique for determining the stress at the Si/SiO2interface
3. Tapered windows in phosphorus-doped SiO2by ion implantation
4. A New Preferential Etch for Defects in Silicon Crystals
5. Viscous flow of thermal SiO2
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