ICP argon discharge simulation: The role of ion inertia and additional RF bias-Reference-Cited by-同舟云学术

ICP argon discharge simulation: The role of ion inertia and additional RF bias

Published:2020-05 Issue:5 Volume:27 Page:053507
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Kropotkin A. N.¹^ORCID,Voloshin D. G.¹^ORCID

Affiliation:

1. Skobeltsyn Institute of Nuclear Physics Lomonosov Moscow State University (SINP MSU), 1(2), Leninskie gory, GSP-1, Moscow 119991, Russian Federation

Funder

Russian Science Foundation

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0003735

Reference37 articles.

1. Review of inductively coupled plasmas for plasma processing

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