Influence of nitrogen-related defects on optical and electrical behaviour in HfO2−xNx deposited by high-power impulse magnetron sputtering
Author:
Affiliation:
1. The School of Applied Sciences, RMIT University, Melbourne, Victoria 3001 Australia
2. Applied and Plasma Physics, The University of Sydney, Sydney, New South Wales 2006, Australia
Funder
Australian Research Council (ARC)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4931099
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