Low-temperature growth of dense and hard Ti0.41Al0.51Ta0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiation-Reference-Cited by-同舟云学术

Low-temperature growth of dense and hard Ti0.41Al0.51Ta0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiation

Published:2017-05-07 Issue:17 Volume:121 Page:171902
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Fager H.¹,Tengstrand O.¹,Lu J.¹,Bolz S.²,Mesic B.²,Kölker W.²,Schiffers Ch.²,Lemmer O.²,Greene J. E.¹³,Hultman L.¹^ORCID,Petrov I.¹³,Greczynski G.¹^ORCID

Affiliation:

1. Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden

2. CemeCon AG, Adenauerstr. 20 A4, D-52146 Würselen, Germany

3. Frederick Seitz Materials Research Laboratory and Materials Science Department, University of Illinois, 104 South Goodwin, Urbana, Illinois 61801, USA

Funder

Åforsk foundation

the Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linköping University

VINN Excellence Center Functional Nanoscale Materials

Knut och Alice Wallenbergs Stiftelse (Knut and Alice Wallenberg Foundation)

Vetenskapsrådet (VR)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4977818