Growth kinetics of amorphous interlayers in Ti thin films on epitaxial Si–Ge layers on silicon and germanium
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1365439
Reference23 articles.
1. Formation of an amorphous Rh‐Si alloy by interfacial reaction between amorphous Si and crystalline Rh thin films
2. Solid‐state interdiffusion reactions in Ni/Ti and Ni/Zr multilayered thin films
3. Solid state interdiffusion reactions of Ni/Zr diffusion couples
4. Formation of an Amorphous Alloy by Solid-State Reaction of the Pure Polycrystalline Metals
5. Thermodynamic and kinetic aspects of the crystal to glass transformation in metallic materials
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1. Titanium-based ohmic contacts in advanced CMOS technology;Journal of Physics D: Applied Physics;2019-09-17
2. Role of Post-Deposition Annealing of Sputtered Ti on Fermi Level Depinning in Ti/TiOx/n-Ge;ECS Journal of Solid State Science and Technology;2019
3. Improved Ti germanosilicidation by Ge pre-amorphization implantation (PAI) for advanced contact technologies;Microelectronic Engineering;2018-12
4. Electrical and structural properties of group-4 transition-metal nitride (TiN, ZrN, and HfN) contacts on Ge;Journal of Applied Physics;2015-09-21
5. Role of an interlayer at a TiN/Ge contact to alleviate the intrinsic Fermi-level pinning position toward the conduction band edge;Applied Physics Letters;2014-03-31
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