Triethylgallium adsorption on Si(100) and Si(111) surfaces
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.101205
Reference11 articles.
1. Chemical beam epitaxy of InP and GaAs
2. Growth of GaAs on Si by MOVCD
3. Initial Growth and Dislocation Accommodation of GaAs on Si(100) by Molecular Beam Epilaxy
4. Initial Stage and Domain Structure of GaAs Grown on Si(100) by Molecular Beam Epitaxy
5. Interface formation of GaAs with Si(100), Si(111), and Ge(111): Core-level spectroscopy for monolayer coverages of GaAs, Ga, and As
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The Si(001) c(4×4) surface reconstruction: a comprehensive experimental study;Surface Science;1999-06
2. The Surface Chemistry of Triallylamine on Si(111) and its Coadsorption with Triethylgallium;MRS Proceedings;1995
3. Adsorption and decomposition of diethylsilane and diethyldichlorosilane on Si(100)(2 × 1) and Si(111)(1 × 1);Surface Science;1994-01
4. Nanometer-Scale Deposition of Ga on HF-Treated Si(111) Surfaces through the Decomposition of Triethylgallium by Scanning Tunneling Microscopy;Japanese Journal of Applied Physics;1993-06-15
5. Deposition of Nano-Scale Ga Dots onto HF-Treated Si(111) Using a Scanning Tunneling Microscope;MRS Proceedings;1992
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