Terrace morphology on fused silica surfaces by Ar+ ion bombardment with Mo co-deposition-Reference-Cited by-同舟云学术

Terrace morphology on fused silica surfaces by Ar+ ion bombardment with Mo co-deposition

Published:2018-07-16 Issue:3 Volume:113 Page:033102
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Chen Dekang¹,Yang Gaoyuan¹,Li Jinyu¹,Hirsch Dietmar²,Liu Ying¹,Frost Frank²,Hong Yilin¹

Affiliation:

1. National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hezuohua South Road 42, 230029 Hefei, Anhui, People's Republic of China

2. Leibniz Institute of Surface Engineering, Permoserstraße 15, 04318 Leipzig, Germany

Funder

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5039565

Reference22 articles.

1. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering

2. Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws

3. Ordered InP nanostructures fabricated by Ar+-ion irradiation

4. Anomalous patterns and nearly defect-free ripples produced by bombarding silicon and germanium with a beam of gold ions

5. Faceting mechanism in the sputtering process

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