Mesoscopic analysis of leakage current suppression in ZrO2/Al2O3/ZrO2 nano-laminates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4804670
Reference20 articles.
1. A high density cylinder-type MIM capacitor integrated with advanced 28nm logic High-K/Metal-Gate process for embedded DRAM
2. New TIT capacitor with ZrO2/Al2O3/ZrO2 dielectrics for 60nm and below DRAMs
3. Fully Integrated 56 nm DRAM Technology for 1 Gb DRAM
4. Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors
5. Electric modulation of conduction in multiferroic Ca-doped BiFeO3 films
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