Application of spin‐coated As2S3thin films in a high resolution trilayer resist system
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.94974
Reference14 articles.
1. Multilayer resist technique for submicron optical lithography
2. Use of antireflective coating in bilayer resist process
3. Linewidth control in projection lithography using a multilayer resist process
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