Multilayer resist technique for submicron optical lithography-Reference-Cited by-同舟云学术

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Multilayer resist technique for submicron optical lithography

Published:1983 Issue:4 Volume:1 Page:1225
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ting C. H.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Realization of high A/R and fine pitch Cu pillars incorporating high speed electroplating with novel strip process;2022 IEEE 72nd Electronic Components and Technology Conference (ECTC);2022-05

2. Lithography and electrodes;Chemical Solution Synthesis for Materials Design and Thin Film Device Applications;2021

3. Fabrication of platinum nanoparticles and nanowires by electron beam lithography (EBL) and nanoimprint lithography (NIL): comparison of ethylene hydrogenation kinetics;Catalysis Letters;2005-04

4. POLYMER MATERIALS FOR MICROELECTRONICS IMAGING APPLICATIONS;Applied Polymer Science: 21st Century;2000

5. Microlithographic Applications of Organosilicon Polymers;Silicon-Containing Polymers;2000

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