On the role of secondary electrons in beam plasma generation inside a dielectric flask by fore-vacuum plasma-cathode electron source
Author:
Affiliation:
1. Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk 634050, Russia
2. Institute of High Current Electronics SB RAS, 2/3, Akademichesky Ave., Tomsk 634055, Russia
Funder
Russian Foundation for Basic Research (RFBR)
Ministry of Education and Science of the Russian Federation (Minobrnauka)
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4991636
Reference24 articles.
1. Surface modification of PET film by plasma-based ion implantation
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3. Recent Progress in Gas Barrier Thin Film Coatings on PET Bottles in Food and Beverage Applications
4. Preparation of oxygen gas barrier polypropylene films by deposition of SiOx films plasma-polymerized from mixture of tetramethoxysilane and oxygen
5. Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing
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