Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing-Reference-Cited by-同舟云学术

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Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing

Published:1999-11 Issue:6 Volume:17 Page:3272-3280
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Schaepkens M.,Rueger N. R.,Beulens J. J.,Li X.,Standaert T. E. F. M.,Matsuo P. J.,Oehrlein G. S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.582054

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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