Dissociation of O2 in low pressure glow discharges in He–O2, Ne–O2, and Ar–O2 gas mixtures
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3043886
Reference23 articles.
1. Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
2. O2rf discharge structure in parallel plates reactor at 13.56 MHz for material processing
3. 'Decoking' of a 'coked' zeolite catalyst in a glow discharge
4. Enhanced decoking of a coked zeolite catalyst using a glow discharge in Ar–O2 gas mixture
5. Efficient production of O+ and O− ions in a helicon wave oxygen discharge
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