Comparison of microwave and lower frequency discharges for plasma polymerization-Reference-Cited by-同舟云学术

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Comparison of microwave and lower frequency discharges for plasma polymerization

Published:1987-06-22 Issue:25 Volume:50 Page:1797-1799
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Claude R.,Moisan M.,Wertheimer M. R.,Zakrzewski Z.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.97700

Reference12 articles.

1. Frequency effects in plasma etching

2. Comparison of microwave and lower frequency plasmas for thin film deposition and etching

3. Characteristics of high-frequency and direct-current argon discharges at low pressures: a comparative analysis

4. A high‐frequency surface wave pumped He‐Ne laser

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