1. Park J-H. Chemical vapor deposition. Surface engineering series Vol. 2 ASM International, Materials Park, OH 2001 ISBN 0-87170-731-4.
2. Mucha JA. Mechanisms in plasma etching. In: IPAT workshop on semiconductor technology: thin film production and properties; 1986. p. 143–52.
3. Modification of surfaces and surface layers by non equilibrium processes;Beamson;Physica Scripta,1988
4. Roth JR. Industrial plasma engineering. Vol 2–Applications to nonthermal plasma processing. Institute of Physics. Bristol and Philadelphia 2001. ISBN 0-07503-0545-2.
5. Comparison of microwave and lower frequency plasmas for thin film deposition and etching;Wertheimer;J Vac Sci Technol A,1985