Photoresist stripping in afterglow of Ar‐O2microwave plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.355779
Reference16 articles.
1. Application of EPR Spectroscopy to Oxidative Removal of Organic Materials
2. Oxidative Removal of Photoresist by Oxygen/Freon® 116 Discharge Products
3. Design criteria for uniform reaction rates in an oxygen plasma
4. Etching mechanisms of polymers in oxygen microwave multipolar plasmas
5. Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas
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