Development of a calibration system for wafer-type temperature sensor-Reference-Cited by-同舟云学术

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Development of a calibration system for wafer-type temperature sensor

Published:2020-11-01 Issue:11 Volume:10 Page:115108
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Kim Jongho¹²^ORCID,Mun Jihun¹^ORCID,Shin Jae-Soo³^ORCID,Kang Sang-Woo¹²^ORCID

Affiliation:

1. Semiconductor Integrated Metrology Team, Advanced Instrumentation Institute, Korea Research Institute of Standards and Science, 267 Gajeong-ro, Daejeon, South Korea

2. Department of Science of Measurement, University of Science and Technology, 217 Gajeong-ro, Daejeon, South Korea

3. Department of Advanced Materials Engineering, Daejeon University, 62 Daehak-ro, Daejeon, South Korea

Funder

Ministry of Trade, Industry and Energy

Korea Research Institute of Standards and Science

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/6.0000536

Reference35 articles.

1. Impact of vacuum equipment contamination on semiconductor yield

2. Impact of Particulate Contaminants on the Current Leakage Defect in OLED Devices

3. M. Friz and F. Waibel, Springer Series in Optical Sciences (Springer, Berlin, Heidelberg, 2003), Vol. 88, pp. 105–130.

4. MOCVD of ZrO2 films from bis(t-butyl-3-oxo-butanoato)zirconium(IV): some theoretical (thermodynamic) and experimental aspects

5. Synthesis and Electrical Characterization of ZrO2 Thin Films on Si(100)

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