Optical properties of a low energy focused ion beam apparatus for direct deposition-Reference-Cited by-同舟云学术

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Optical properties of a low energy focused ion beam apparatus for direct deposition

Published:1997-06 Issue:6 Volume:68 Page:2331-2338
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Nagamachi Shinji,Ueda Masahiro,Yamakage Yasuhiro,Maruno Hiromasa,Ishikawa Junzo

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1148144

Reference20 articles.

1. Focused ion beam technology and applications

2. Scanning ion beam techniques for the examination of microelectronic devices

3. Physics of Ion Plating and Ion Beam Deposition

4. Low-energy mass-separated ion beam deposition of materials

5. Low-temperature epitaxial growth of Si and Ge and fabrication of isotopic heterostructures by direct ion beam deposition

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low energy focused ion beam system design;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2006-07

2. Focused ion beam direct deposition and its applications;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-07

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