Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3276706
Reference9 articles.
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1. Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies;Japanese Journal of Applied Physics;2022-11-30
2. Optical in situ monitoring of plasma-enhanced atomic layer deposition process;Japanese Journal of Applied Physics;2018-05-29
3. Analytical calculation of the light-collection efficiency of an optical emission spectrometer with the effective solid-angle method;Applied Optics;2016-05-12
4. Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-11
5. Electron beam excitation method to study gas phase during etch processes;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-07
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