Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy-Reference-Cited by-同舟云学术

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Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy

Published:2012-11 Issue:6 Volume:30 Page:061303
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Stephan Thamban P. L.,Yun Stuart,Padron-Wells Gabriel,Hosch Jimmy W.,Goeckner Matthew J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4756694

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Redeposition-free of silicon etching by CF4 microwave plasma in a medium vacuum process regime;Surface and Coatings Technology;2020-09

2. Non-Invasive Plasma Monitoring Tools and Multivariate Analysis Techniques for Sensitivity Improvement;Applied Science and Convergence Technology;2014-11-30

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