Area-selective nucleation of copper on fluorocarbon–resin surface using ArF excimer laser-induced chemical modification
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.121435
Reference12 articles.
1. New routes to Cu-patterned teflon substrates
2. Formation of copper patterns on poly(tetrafluoroethylene) via radiation controlled chemical etching and chemical‐vapor deposition
3. Direct deposition of patterned copper films on Teflon
4. Surface modification and metallization of fluorocarbon polymers by excimer laser processing
5. Photochemical modification of polytetrafluoroethylene into oleophilic property using an ArF excimer laser
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