The influence of impurities on the formation of nanocone structures on silicon surface irradiated by low energy helium plasma-Reference-Cited by-同舟云学术

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The influence of impurities on the formation of nanocone structures on silicon surface irradiated by low energy helium plasma

Published:2020-07-14 Issue:2 Volume:128 Page:023301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Shi Quan¹^ORCID,Kajita Shin²^ORCID,Ohno Noriyasu¹,Tokitani Masayuki³,Nagata Daisuke³,Feng Shuangyuan¹

Affiliation:

1. Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

2. Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya 464-8603, Japan

3. National Institute for Fusion Science, 322-6 Oroshi, Toki, Gifu 509-5292, Japan

Funder

Japan Society for the Promotion of Science

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0010416

Reference25 articles.

1. Control of shape of silicon needles fabricated by highly selective anisotropic dry etching

2. An 18.2%-efficient black-silicon solar cell achieved through control of carrier recombination in nanostructures

3. Nanofabrication of arrays of silicon field emitters with vertical silicon nanowire current limiters and self-aligned gates

4. The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

5. Nanostructure formation on silicon surfaces by using low energy helium plasma exposure

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1. Germanium nanostructures by helium plasma irradiation;Japanese Journal of Applied Physics;2024-07-01

2. Lithography-Free Nanofabrication on Various Semiconductors by the Codeposition Etching Technique;Langmuir;2024-06-10

3. Tungsten fuzz growth at low temperatures (<900 K) on a surface with nanocones;Nuclear Materials and Energy;2024-06

4. Nanopatterning of Si surfaces by normal incident He plasma irradiation;Applied Physics Letters;2024-03-04

5. Cone array formation on Si surfaces by low-energy He plasma irradiation with magnetron sputtering pre-deposited Ta;Journal of Applied Physics;2024-03-01

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