Lithography-Free Nanofabrication on Various Semiconductors by the Codeposition Etching Technique-Reference-Cited by-同舟云学术

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Lithography-Free Nanofabrication on Various Semiconductors by the Codeposition Etching Technique

Published:2024-06-10 Issue:24 Volume:40 Page:12437-12442
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Shi Quan¹²^ORCID,Kajita Shin²,Ohno Noriyasu³,Tanaka Hirohiko³,Yasuhara Ryo¹⁴,Fujiwara Hideki⁵,Uehara Hiyori¹⁴

Affiliation:

1. National Institute for Fusion Science, Toki 509-5292, Japan

2. Graduate School of Frontier Sciences, The University of Tokyo, Kashiwa ,Chiba277-8561, Japan

3. Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

4. The Graduate University for Advanced Studies, SOKENDAI, 322-6, Oroshi-cho, Toki, Gifu509-5292,Japan

5. Faculty of Engineering, Hokkai-Gakuen University, Chuo-ku,Sapporo 064-0926, Japan

Funder

Research Foundation for Opto-Science and Technology

Institute of Materials and Systems for Sustainability, Nagoya University

National Institute for Fusion Science

Cooperative Research Program of “Network Joint Research Center for Materials and Devices

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.4c00686

Reference32 articles.

1. Black silicon solar cells with interdigitated back-contacts achieve 22.1% efficiency

2. The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

3. GaAs random laser

4. Random laser action in GaN nanocolumns

5. Selective-area growth of single-crystal wurtzite GaN nanorods on SiOx/Si(001) substrates by reactive magnetron sputter epitaxy exhibiting single-mode lasing

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