Thermally induced epitaxial recrystallization of NiSi2and CoSi2
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103229
Reference13 articles.
1. Channeling studies of radiation damage in metal‐silicides
2. Epitaxial reordering of ion-irradiated NiSi2 layers
3. Crystallization investigation of NiSi2 thin films
4. Direct observation of laser‐induced solid‐phase epitaxial crystallization by time‐resolved optical reflectivity
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1. Ion‐Induced Amorphization and Regrowth of C49 and C54 TiSi2;Journal of The Electrochemical Society;1999-03-01
2. Investigating the thermodynamics and kinetics of thin film reactions by differential scanning calorimetry;Journal of Physics D: Applied Physics;1997-12-07
3. Diffusion Synthesis of Silicides in Thin-Film Metal—Silicon Structures;Rapid Thermal Processing of Semiconductors;1997
4. Solid solubility and diffusion of boron in single‐crystalline cobalt disilicide;Journal of Applied Physics;1996-09
5. Crystallization and growth of Ni‐Si alloy thin films on inert and on silicon substrates;Journal of Applied Physics;1995-04-15
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