Detection of Si nanoclusters by x-ray scattering during silicon film deposition by mesoplasma chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2956692
Reference30 articles.
1. Measurements of particle size kinetics from nanometer to micrometer scale in a low‐pressure argon‐silane radio‐frequency discharge
2. Investigation of Growth Mechanisms of Clusters in a Silane Discharge With the Use of a Fluid Model
3. Numerical Modeling of Gas-Phase Nucleation and Particle Growth during Chemical Vapor Deposition of Silicon
4. Particle‐plasma interactions in low‐pressure discharges
5. Modeling of particulate coagulation in low pressure plasmas
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