Author:
Sharp J. A.,Cowern N. E. B.,Webb R. P.,Kirkby K. J.,Giubertoni D.,Gennaro S.,Bersani M.,Foad M. A.,Cristiano F.,Fazzini P. F.
Subject
Physics and Astronomy (miscellaneous)
Reference20 articles.
1. Nonmelt Laser Annealing of 1 Kev Boron Implanted Silicon
2. Effects of Nonmelt Laser Annealing on a 5keV Boron Implant in Silicon
3. Nonmelt laser annealing of 5-KeV and 1-KeV boron-implanted silicon
4. S. Earles, M. Law, K. Jones, J. Frazer, S. Talwar, D. Downery, and E. Arevalo, Proceedings of the 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 28–30 September 2004 (IEEE, Piscataway, NJ, 2004), p. 143.
5. Enhanced boron activation in silicon by high ramp-up rate solid phase epitaxial regrowth
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