Chemical vapor deposition of Si on chlorosilane-treated SiO2 surfaces. II. Selective deposition in the regions defined by electron-beam irradiation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1402978
Reference30 articles.
1. High-power InGaN-based blue laser diodes with a long lifetime
2. Nanostructure fabrication using the selective thermal desorption of SiO2 induced by electron beams
3. Nanoscale selective-area epitaxial growth of Si using an ultrathin SiO2/Si3Ni4 mask patterned by an atomic force microscope
4. Ultra Thin SiO2 Mask Layer for Nano-Scale Selective-Area Pecvd of Si
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Custom design of optical-grade thin films of silicon oxide by direct-write electron-beam-induced deposition;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006
2. Chemical vapor deposition of Si on chlorosilane-treated SiO2 surfaces. I. Suppression and enhancement of Si nucleation;Journal of Applied Physics;2001-10-15
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