Insituinvestigation of the nucleation of microcrystalline Si
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96686
Reference8 articles.
1. Substrate temperature dependence of microcrystallinity in plasma‐deposited, boron‐doped hydrogenated silicon alloys
2. An ellipsometry study of a hydrogenated amorphous silicon basedn‐istructure
3. Surface analysis during vapour phase growth
4. Growth of hydrogenated amorphous silicon due to controlled ion bombardment from a pure silane plasma
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5. Microcrystalline Silicon Thin-Films Grown by Plasma Enhanced Chemical Vapour Deposition - Growth Mechanisms and Grain Size Control;Solid State Phenomena;2003-06
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